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NEW QUESTION: 1
Which server technology will enable increased throughput, lower latency, and lower CPU utilization across the servers?
A. RDMA
B. TCP/IP Offload Engine
C. virtual extensible LAN (VXLAN)
D. InfiniBand
Answer: A
Explanation:
Explanation/Reference:
Reference https://www.hpe.com/h20195/v2/getpdf.aspx/a00007858enw.pdf?ver=1.0

NEW QUESTION: 2
Which IEEE 802.11 standard allows the endpoint of a subscriber to dynamically locate and connect to a wireless network that belongs to their service provider or a roaming partner?
A. IEEE 802.11v - "Wireless Network Management"
B. IEEE 802.11k - "Radio Resource Management
C. IEEE 802.11u - "Interworking with External Networks"
D. IEEE 802.11r - "Fast Basic Service Set (BSS) Transition"
Answer: C

NEW QUESTION: 3
When gathering requirements for setting the Password policy which TWO targets need to be identified?
A. Each instance of a service type
B. Each service type
C. Each approval node in a workflow
D. Each request of a user change
E. Each instance of a reconciliation schedule
Answer: B,C

NEW QUESTION: 4
Universal Industries limits its operations to exports to foreign countries. What can be said about
Universal's exposures to exchange rate risk?
A. Universal is subject to potential transaction, economic and translation exposures to exchange rate risk.
B. Universal is subject to potential transaction and economic exposures to exchange rate risk.
C. Universal is subject transaction and translation exposures to exchange rate risk.
D. Universal is subject to economic and translation exposures to exchange rate risk.
Answer: B
Explanation:
Choice "b" is correct. Universal is subject to transaction risks associated with settlement of export
transactions and is subject to economic risks associated with the satisfaction of domestic expenses
denominated in domestic currencies with imported revenues denominated in a foreign currency. No
translation exposure exists since there is no foreign investment or subsidiary. Choices "a", "c", and "d" are
incorrect, per the above Explanation: .